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Influence of the Surface on the Galvanomagnetic Properties of Tellurium
Author(s) -
Englert Th.,
von Klitzing K.,
Silbermann R.,
Landwehr G.
Publication year - 1977
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.2220810110
Subject(s) - tellurium , etching (microfabrication) , layer (electronics) , surface (topology) , materials science , surface layer , field (mathematics) , nanotechnology , metallurgy , geometry , mathematics , pure mathematics
At real tellurium surfaces natural accumulation layers exist which can be changed substantially by different etching processes. For pure samples this surface layer may mask the galvanomagnetic properties of the bulk completely. Employing a new etching process the influence of the surface can be reduced drastically, complete elimination is possible using a field effect arrangement. A comparison of the results obtained from samples with different degrees of accumulation at the surface allows a separation of the galvanomagnetic properties of the surface and the bulk.