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Etchless Fabrication of High‐Quality Refractory Titanium Nitride Nanostructures
Author(s) -
Panos Stavros,
Tselekidou Despina,
Kassavetis Spyros,
Fekas Ilias,
Arvanitidis John,
Christofilos Dimitris,
Karfaridis Dimitrios,
Dellis Spilios,
Logothetidis Stergios,
Patsalas Panos
Publication year - 2021
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.202170033
Subject(s) - materials science , fabrication , nanotechnology , titanium nitride , nanosphere lithography , nitride , sputtering , nanomaterials , titanium , sputter deposition , nanostructure , lithography , refractory (planetary science) , plasmon , optoelectronics , thin film , metallurgy , layer (electronics) , medicine , alternative medicine , pathology
The back‐cover image illustrates the removal of the colloidal nanosphere lithography mask (in the right side of the image) revealing the well‐defined, high crystalline quality triangular nano‐islands of titanium nitride, an emerging nanomaterial for plasmonic applications, fabricated by reactive magnetron sputtering. For further information see article number 2000573 by Spyros Kassavetis, Panos Patsalas and co‐workers, which is also part of the virtual issue “60 years of pss”. (Artistic illustration: Stelios Karamanidis).