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Off‐Stoichiometry of Magnetron Sputtered Ba 1− x Sr x TiO 3 Thin Films (Phys. Status Solidi B 10/2019)
Author(s) -
Rachut Karsten,
Bayer Thorsten J. M.,
Wolff Jan O.,
Kmet Brigita,
Benčan Andreja,
Klein Andreas
Publication year - 2019
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201970039
Subject(s) - x ray photoelectron spectroscopy , stoichiometry , analytical chemistry (journal) , thin film , sputter deposition , substrate (aquarium) , materials science , cavity magnetron , dielectric , deposition (geology) , sputtering , chemistry , nuclear magnetic resonance , nanotechnology , optoelectronics , physics , paleontology , oceanography , chromatography , sediment , geology , biology
The back‐cover image shows the Ti/(Ba+Sr) ratio of tunable dielectric (Ba,Sr)TiO 3 thin films prepared by radio‐frequency magnetron sputtering from nominally stoichiometric targets. Independent of the Ba/Sr ratio, the Ti content at the thinfilm surfaces, which is determined using in‐situ X‐ray photoelectron spectroscopy (XPS) measurements, varies substantially with deposition conditions. The composition at the surface varies as (Ba,Sr)TiO 3 ± x (Ba,Sr)O. Apart from the deposition rate, substrate orientation and oxygen content of the target influence the resulting film composition. For further details see article no. 1900148 by Andreas Klein and co‐workers.