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Equilibrium Morphologies of Faceted GaN under the Metalorganic Vapor‐Phase Epitaxy Condition: Wulff Construction Using Absolute Surface Energies
Author(s) -
Seta Yuki,
Pradipto Abdul-Muizz,
Akiyama Toru,
Nakamura Kohji,
Ito Tomonori
Publication year - 2020
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201900523
Subject(s) - metalorganic vapour phase epitaxy , epitaxy , plateau (mathematics) , materials science , vapor phase , phase (matter) , condensed matter physics , gas phase , semiconductor , thermodynamic equilibrium , optoelectronics , nanotechnology , chemistry , thermodynamics , physics , mathematics , mathematical analysis , organic chemistry , layer (electronics)
An equilibrium Wulff construction using absolute surface energies for various orientations is conducted to elucidate the morphology change of GaN under the metalorganic vapor‐phase epitaxy (MOVPE) condition. The calculated equilibrium shapes suggest that the morphology mainly consists of { 1 1 ¯ 01 } and { 1 1 ¯ 00 } facets under Ga‐rich condition for selective area growth (SAG) on [ 1 1 ¯ 00 ] lateral direction. In contrast, an equilibrium crystal shape including the larger area of { 1 1 ¯ 01 } facets and (0001) plateau with smaller { 1 1 ¯ 00 } facets emerges under N‐rich condition. Furthermore, by incorporating growth conditions such as growth temperature and carrier gas, it is found that the (0001) plateau hardly emerges under H 2 carrier gas condition at low temperature. The results under H 2 carrier gas are found to be different from those under N 2 carrier gas where the (0001) plateau slightly emerges at low temperature. The calculated results manifest that our approach can provide the determination of equilibrium shape of semiconductor materials during epitaxial growth.