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Morphological and optical properties of low temperature processed SnO 2 :F
Author(s) -
Uprety Prakash,
Lambright Kelly J.,
Grice Corey R.,
Junda Maxwell M.,
Giolando Dean M.,
Podraza Nikolas J.
Publication year - 2017
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201700102
Subject(s) - materials science , analytical chemistry (journal) , scanning electron microscope , electrical resistivity and conductivity , soda lime glass , tin oxide , absorption spectroscopy , thin film , absorption (acoustics) , oxide , metallurgy , composite material , optics , chemistry , nanotechnology , physics , chromatography , electrical engineering , engineering
Thin films of transparent conducting fluorine doped tin oxide (SnO 2 :F) on soda lime glass and stainless steel substrates are prepared by spray pyrolysis at low temperature ≤250 °C. Optical properties in the form of complex dielectric function ( ϵ = ϵ 1 + i ϵ 2 ) spectra are obtained using spectroscopic ellipsometry from 0.035 to 5.89 eV for SnO 2 :F on glass and from 0.75 to 5.89 eV for SnO 2 :F on stainless steel. The absorption coefficient (α) spectra are extracted from spectra in ϵ for the film on soda lime glass from 0.035 to 5.89 eV and on stainless steel from 0.75 to 5.89 eV. Direct band gaps for SnO 2 :F thin films on soda lime glass and stainless steel substrates are determined to be 3.45 ± 0.01 and 3.60 ± 0.01 eV, respectively. Infrared extended measurement shows an absorption feature at 0.063 eV (508 cm −1 ) which may be attributed to Sn–O and Sn–F bonding. A broad background phonon absorption feature due to Sn–OH and O–H bonding is also identified at 0.3 eV (2420 cm −1 ). Resistivity is deduced from ϵ . Improved agreement between optically and electrically determined resistivity is obtained when the infrared range spectrum is analyzed. The morphologies of both the films are studied by X‐ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM).