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Liquid‐source growth of graphene on Ag(001)
Author(s) -
Grandthyll Samuel,
Jacobs Karin,
Müller Frank
Publication year - 2015
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201552048
Subject(s) - graphene , x ray photoelectron spectroscopy , chemical vapor deposition , materials science , monolayer , low energy electron diffraction , electron diffraction , nanotechnology , chemical engineering , analytical chemistry (journal) , diffraction , chemistry , optics , organic chemistry , physics , engineering
The epitaxial growth of graphene on the Ag(001) surface via chemical vapor deposition (CVD) of propene and via liquid precursor deposition (LPD) by ex situ rinsing with acetone is investigated by X‐ray photoelectron spectroscopy (XPS), low energy electron diffraction (LEED), and Fermi surface mapping (FSM). In case of LPD, the growth of graphene is quite similar to that previously obtained for h‐BN monolayers on the same surface. The weak interaction between the graphene layer and the Ag(001) surface prevents a preferred alignment of the graphene lattice, leading to graphene domains with statistically distributed azimuthal orientations. In contrast to the LPD method, it is not possible to provide any carbon via the standard CVD technique. The present results give evidence that LPD represents a promising alternative for the growth of graphene, especially on weakly interacting surfaces.