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Low pressure chemical vapor deposition synthesis of hexagonal boron nitride on polycrystalline metal foils
Author(s) -
Gibb Ashley,
Alem Nasim,
Zettl Alex
Publication year - 2013
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201300088
Subject(s) - borazine , chemical vapor deposition , materials science , hybrid physical chemical vapor deposition , combustion chemical vapor deposition , boron nitride , raman spectroscopy , chemical engineering , crystallite , nanotechnology , thin film , inorganic chemistry , carbon film , metallurgy , chemistry , physics , engineering , optics
The two‐dimensional sp 2 ‐bonded material hexagonal boron nitride (h‐BN) has unique electronic, thermal, mechanical, and chemical properties. It has recently found use as an ideal substrate for graphene‐based electronic devices. We here describe synthesis of mono‐ to few‐layer h‐BN films using low pressure chemical vapor deposition (LPCVD) from borazine, with nickel, copper and platinum employed as catalytic substrates, and transfer of some of these lms using a non‐polymer method. Characterization of the films via Raman spectroscopy and transmission electron microscopy (TEM) is performed. Chemical vapor deposition synthesis of hexagonal boron nitride from borazine using metallic substrates.