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CVD growth and processing of graphene for electronic applications
Author(s) -
Kumar Shishir,
McEvoy Niall,
Kim HyeYoung,
Lee Kangho,
Peltekis Nikos,
Rezvani Ehsan,
Nolan Hugo,
Weidlich Anne,
Daly Ronan,
Duesberg Georg S.
Publication year - 2011
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201100179
Subject(s) - graphene , chemical vapor deposition , materials science , nanotechnology , nickel , carbon fibers , copper , graphene foam , graphene nanoribbons , graphene oxide paper , deposition (geology) , chemical engineering , metallurgy , composite number , composite material , engineering , paleontology , sediment , biology
The remarkable properties of graphene have potential for numerous applications; however, their exploitation depends on its reliable production. The chemical vapour deposition (CVD) growth of graphene on metal surfaces has become one of the most promising strategies for the production of high quality graphene in a scaleable manner. Here, we discuss graphene growth on nickel (Ni) and copper (Cu) directly from both gaseous hydrocarbons and solid carbon precursors. Further, we discuss in detail the transfer of graphene films to insulating substrates, by direct and polymer supported transfer methods.