Premium
Front Cover (Phys. Status Solidi B 9/2010)
Author(s) -
Barbato Alessandro,
Cavallotti Carlo
Publication year - 2010
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.201090018
Subject(s) - surface (topology) , diffusion , materials science , cover (algebra) , feature (linguistics) , surface diffusion , front (military) , statistical physics , deposition (geology) , chemical vapor deposition , ab initio , front cover , reactivity (psychology) , chemical physics , thermodynamics , nanotechnology , chemistry , physics , mathematics , engineering , geometry , geology , mechanical engineering , quantum mechanics , philosophy , alternative medicine , linguistics , pathology , paleontology , adsorption , medicine , sediment , meteorology
The implementation of detailed surface kinetic mechanisms describing the thin film growth dynamics, into models of chemical vapor deposition reactors has been a challenge for many years. In their Feature Article on pp. 2127–2146 , Barbato and Cavallotti review the literature concerning the study of the Si(100)2×1 surface dynamics and introduce a multiscale model that captures the main features of its reactivity. The model combines the results of ab initio calculations with an atomistic description of the Si surface, obtained using a 3D KMC model that explicitly accounts for the 2×1 surface reconstruction and the formation and diffusion of Si dimers on a hydrogenated surface.