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Enhanced back and forward scattering in the reflection of light from weakly rough random metal surfaces
Author(s) -
Simonsen Ingve
Publication year - 2010
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.200983938
Subject(s) - scattering , light scattering , optics , polarization (electrochemistry) , diffuse reflection , surface roughness , surface finish , materials science , spectral density , surface plasmon , ray , excitation , amplitude , physics , molecular physics , computational physics , plasmon , chemistry , mathematics , quantum mechanics , statistics , composite material
The scattering of light from a weakly rough random silver surface characterized by a double rectangular power spectrum is studied by numerical simulations. This power spectrum can support both the enhanced back and forward scattering phenomena, which for weakly rough surfaces, are both related to the excitation of surface plasmon polaritons. Here we review these phenomena and present new results from a numerical study of the dependence of the diffuse scattering on the amplitudes ( γ i , i = 1, 2) of the two rectangular portions of the power spectrum. It is found that there exist an optimal range of ratios, γ 2 / γ 1 , over which forward scattering peaks can be observed. By just changing the correlations along the interface, while keeping all other parameters like roughness, polarization, and angle of incidence unchanged, the fraction of the incident light that is scattered diffusely can be as large as 16%, while for other parameters as small as 1%. Moreover, a change in the correlation function only, can result in a 3.5 times increase in the amount of light that is absorbed at the weakly rough metal interface ( σ = 10 nm).