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PAMBE growth and in‐situ characterisation of clean (2 × 2) and (√3 × √3) R30° reconstructed InN(0001) thin films
Author(s) -
Himmerlich M.,
Eisenhardt A.,
Schaefer J. A.,
Krischok S.
Publication year - 2009
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.200880817
Subject(s) - reflection high energy electron diffraction , x ray photoelectron spectroscopy , molecular beam epitaxy , electron diffraction , in situ , indium , surface reconstruction , thin film , diffraction , reflection (computer programming) , materials science , chemistry , surface (topology) , analytical chemistry (journal) , epitaxy , optoelectronics , optics , nanotechnology , nuclear magnetic resonance , physics , layer (electronics) , organic chemistry , geometry , mathematics , chromatography , computer science , programming language
The surface properties of thin InN(0001) films grown by plasma assisted molecular beam epitaxy (PAMBE) were characterised. Two stable surface reconstructions (a (2 × 2) and a (√3 × √3) R30°) are identified which develop depending on the used preparation conditions. The structural, compositional and electronic surface properties were analysed in‐situ using reflection high energy electron diffraction (RHEED) and photoelectron spectroscopy (PES). From the absence of surface contaminants as well as excess indium it can be concluded that these superstructures are formed by single adatom layers. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)