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Some physical properties of sputtered Ni 0.8 Fe 0.2 –O films
Author(s) -
Kohmoto O.,
Takahashi H.,
Kimoto K.
Publication year - 2007
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.200777304
Subject(s) - sputtering , antiferromagnetism , ferromagnetism , materials science , partial pressure , oxygen , phase (matter) , analytical chemistry (journal) , crystallography , thin film , condensed matter physics , chemistry , nanotechnology , physics , organic chemistry , chromatography
By reactive sputtering with changing oxygen partial‐pressure O 2 /(Ar+O 2 ) during sputtering, both ferromagnetic Ni 0.8 Fe 0.2 and antiferromagnetic (Ni 0.8 Fe 0.2 ) 1‐ γ O single‐phase films are obtained from one sputtering target. The crystallographic, electric and magnetic properties of Ni 0.8 Fe 0.2 –O films are similar to those of Ni‐O films studied previously. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)