Some physical properties of sputtered Ni 0.8 Fe 0.2 –O films | Zendy

Kohmoto O. | Zendy; Takahashi H. | Zendy; Kimoto K. | Zendy

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Some physical properties of sputtered Ni 0.8 Fe 0.2 –O films

Author(s) -

Kohmoto O.,

Takahashi H.,

Kimoto K.

Publication year - 2007

Publication title -

physica status solidi (b)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.51

H-Index - 109

eISSN - 1521-3951

pISSN - 0370-1972

DOI - 10.1002/pssb.200777304

Subject(s) - sputtering , antiferromagnetism , ferromagnetism , materials science , partial pressure , oxygen , phase (matter) , analytical chemistry (journal) , crystallography , thin film , condensed matter physics , chemistry , nanotechnology , physics , organic chemistry , chromatography

By reactive sputtering with changing oxygen partial‐pressure O 2 /(Ar+O 2 ) during sputtering, both ferromagnetic Ni 0.8 Fe 0.2 and antiferromagnetic (Ni 0.8 Fe 0.2 ) 1‐ γ O single‐phase films are obtained from one sputtering target. The crystallographic, electric and magnetic properties of Ni 0.8 Fe 0.2 –O films are similar to those of Ni‐O films studied previously. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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