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Kinetic Monte Carlo simulations of amorphous thin‐film growth
Author(s) -
Elsholz F.,
Schöll E.,
Rosenfeld A.
Publication year - 2007
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.200743257
Subject(s) - monte carlo method , kinetic monte carlo , amorphous solid , kinetic energy , statistical physics , thin film , surface finish , materials science , dynamic monte carlo method , surface roughness , physics , thermodynamics , chemistry , nanotechnology , crystallography , mathematics , classical mechanics , statistics , composite material
Amorphous SiO 2 and Nb 2 O 5 thin‐film growth simulations are performed on the basis of a solid‐on‐solid model considering fluctuating effective atom binding energies. We show that by assuming laterally correlated random energy fluctuations, one can obtain effective growth exponents and overall film roughness in agreement with experimental results. The solid‐on‐solid model is solved by event‐based kinetic Monte Carlo simulations and the obtained results are compared to atomic force microscopy data. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)