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Epitaxial formation of a multilayer Pd–Ta surface alloy on a Ta substrate
Author(s) -
Szczepkowicz A.,
Ciszewski A.
Publication year - 2003
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.200301519
Subject(s) - epitaxy , tantalum , materials science , annealing (glass) , field ion microscope , alloy , substrate (aquarium) , layer (electronics) , palladium , crystallography , metallurgy , ion , composite material , catalysis , chemistry , biochemistry , oceanography , organic chemistry , geology
A thick palladium layer (∼5 nm) is deposited onto a curved tantalum surface. The system is submitted to several annealing cycles. Structural changes within 0–5 nm below the surface are observed using Field Ion Microscopy. At 800 K, an atomic intermixing of adsorbate and substrate is observed. Pd atoms are detected within the first five atomic layers of the Ta substrate. At 1100 K, a multilayer alloy is formed at the surface, oriented epitaxially with respect to the Ta{100} planes.