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Low Temperature Motion of Néel and Bloch Walls
Author(s) -
Bostanjoglo O.,
Kreisel P.,
Oelmann A.
Publication year - 1970
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19700380211
Subject(s) - condensed matter physics , barkhausen stability criterion , permalloy , materials science , monocrystalline silicon , barkhausen effect , dislocation , magnetic field , magnetization , physics , metallurgy , silicon , quantum mechanics
The motion of Néel and Bloch walls in a quasistatic magnetic field was investigated by Lorentz microscopy in the range 4 to 300°K. Below a critical temperature (28 °K for polycrystalline Permalloy and 40°K for poly‐ and monocrystalline iron and cobalt films) the usual Barkhausen jumps of the wall motion with jump size 1 to 50 μm were abruptly quenched. The wall then moved by tiny jumps (size ≈ 0.1 or < 0.03 μm) and in a constant field. These effects – associated with the motion of Néel, Bloch, cross‐tie walls and circle Bloch lines along the walls of locked domains – were ascribed to the suppression of the diffusion and orientation after‐effect of crystal defects.