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Magnetic Anisotropy in F.C.C. Single Crystal Cobalt—Nickel Electrodeposited Films. II. Thickness Dependence of the Magnetocrystalline and Uniaxial Anisotropy Constants from (110) Deposits
Author(s) -
Lord D. G.,
Goddard J.
Publication year - 1970
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19700370217
Subject(s) - magnetocrystalline anisotropy , anisotropy , materials science , nickel , magnetic anisotropy , electroplating , cobalt , condensed matter physics , single crystal , crystallography , alloy , magnetometer , crystal (programming language) , magnetization , metallurgy , chemistry , composite material , magnetic field , optics , physics , computer science , programming language , layer (electronics) , quantum mechanics
Torque magnetometry has shown a pronounced variation with film thickness of the magnetocrystalline anisotropy constants K 1 , K 2 , K 3 of Co—Ni f.c.c. films, of between 100 and 1000 Å, electroplated on to (110) copper single crystal substrates. A thickness dependent uniaxial anisotropy K u of the order of K 1 was found to be present for all alloy compositions, its axis being a <001> direction in the plane of the film. An empirical relationship which describes the thickness variation of K u has been constructed containing three terms representing pseudomorphic, ‘unnatural‐phase’, and occluded hydrogen strain energies.