Premium
Sulphur Diffusion in Copper: Departure from the Arrhenius Plot
Author(s) -
Moya F.,
MoyaGontier G. E.,
CabaneBrouty F.
Publication year - 1969
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19690350240
Subject(s) - arrhenius plot , diffusion , arrhenius equation , activation energy , copper , plot (graphics) , dislocation , linearity , thermodynamics , line (geometry) , sulfur , materials science , crystallography , condensed matter physics , chemistry , analytical chemistry (journal) , physics , metallurgy , mathematics , geometry , quantum mechanics , statistics , chromatography
A study is made of sulphur diffusion in copper single crystals using 35 S between 550 and 1000 °C. The plot log D = f (1/ T ) was not a straight line. Different models were examined to explain the departure from linearity in the Arrhenius plot. A simple model is proposed, basing on classical mechanisms: monovacancy diffusion and diffusion along randomly distributed dislocations. For T > 800 °C, Q = 2.14 eV, and D 0 = 23 cm 2 s −1 , the unusually high diffusion coefficients do not agree well with the value of Q , similar to that of self diffusion. For T < 800 °C, the dislocation model gives a binding energy of some tenths of an electron‐volt.