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Annealing kinetics of voids and the Self‐diffusion coefficient in aluminum
Author(s) -
Volin T. E.,
Balluffi R. W.
Publication year - 1968
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19680250116
Subject(s) - annealing (glass) , activation energy , kinetics , isothermal process , aluminium , analytical chemistry (journal) , melting point , shrinkage , transmission electron microscopy , diffusion , materials science , chemistry , atmospheric temperature range , tracer , self diffusion , thermodynamics , composite material , nanotechnology , physics , self service , chromatography , quantum mechanics , marketing , nuclear physics , business
The annealing kinetics of voids in 99.9999 wt% pure aluminum were studied over the temperature range 85 to 209 °C in thin specimens by transmission electron microscopy. The isothermal shrinkage of individual voids was measured and interpreted on the basis of a self‐diffusion annealing model. The self‐diffusion coefficient of aluminum, as determined from the data, was given by D s = 0.176 exp (‐1.31 eV/ kt ) cm 2 s −1 . The activation energy, Q = 1.31 eV, is significantly lower than the value Q = 1.48 eV determined by Lundy and Murdock at temperatures near the melting point in the only reported measurement by the radioactive tracer technique. Considerable evidence from a variety of sources is discussed which tends to support the present result.