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Electrode‐Limited to Bulk‐Limited Conduction in Silicon Oxide Films
Author(s) -
Stuart M.
Publication year - 1967
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19670230219
Subject(s) - thermal conduction , materials science , electrode , silicon , oxide , voltage , current (fluid) , silicon oxide , optoelectronics , condensed matter physics , electrical engineering , composite material , chemistry , physics , metallurgy , silicon nitride , engineering
The current‐voltage behaviour of evaporated silicon oxide films, several microns thick, have been investigated. At low voltages conduction is determined by contact barriers at the electrodes. At high voltages conduction is bulk‐limited and obeys a modified Poole‐Frenkel equation.