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On the formation of single crystal films of F.C.C. metals on alkali halide cleavage planes in ultrahigh vacuum
Author(s) -
Kunz K. M.,
Green A. K.,
Bauer E.
Publication year - 1966
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19660180141
Subject(s) - electron diffraction , cleavage (geology) , halide , transmission electron microscopy , vacuum evaporation , nucleation , crystallography , materials science , vacuum deposition , annealing (glass) , alkali metal , diffraction , thin film , coalescence (physics) , ultra high vacuum , reflection high energy electron diffraction , analytical chemistry (journal) , chemistry , optics , inorganic chemistry , nanotechnology , composite material , organic chemistry , physics , fracture (geology) , astrobiology
Thin films of Au, Al, and Ag are evaporated in an ultrahigh‐vacuum reflection electron diffraction unit onto NaCl, KCl, and KI {100} surfaces cleaved in air and in situ. Their structure is studied by reflection diffraction during and after deposition, and by transmission electron diffraction microscopy. The results of simultaneous evaporation onto crystals with different surface condition (air versus vacuum cleaved) or composition show that the different stages of film growth (mainly nucleation and coalescence) depend in a complicated manner upon surface condition and composition. Electron irradiation prior and during deposition, preannealing of the air cleaved surface, and annealing of the film after deposition strongly influence the film structure.