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The Influence of the Primary X‐Ray Beam Divergence on the X‐Ray Wave Field Absorption Coefficients Measured by Means of the Three‐Crystal X‐Ray Spectrometer
Author(s) -
Godwod K.,
Kowalczyk R.,
LefeldSosnowska M.
Publication year - 1966
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19660170246
Subject(s) - monochromator , x ray , crystal (programming language) , diffraction , beam (structure) , optics , reflection (computer programming) , spectrometer , total external reflection , divergence (linguistics) , gaussian , radiation , beam divergence , x ray spectroscopy , absorption (acoustics) , physics , atomic physics , beam diameter , total internal reflection , spectroscopy , wavelength , linguistics , philosophy , quantum mechanics , computer science , programming language , laser , laser beams
An analysis is made of the effect of the primary X‐ray beam divergence on the dependence of the reflected power on crystal thickness d (for Laue diffraction). It is shown that this effect is important, and should be taken into account in the interpretation of experimental data. Calculations are performed for the (220) reflection of a Si single crystal for CuK α1 radiation under the assumption that the monochromator broadening function V (y) can be approximated by a Gaussian function with width ω v . The curves calculated for several ω v are presented.