Premium
On the Origin of M‐Induced Anisotropy in Nickel and Permalloy Films
Author(s) -
Kneer G.,
Zinn W.
Publication year - 1966
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19660170137
Subject(s) - permalloy , magnetostriction , anisotropy , nickel , condensed matter physics , materials science , annealing (glass) , thin film , magnetic anisotropy , magnetic field , nuclear magnetic resonance , magnetization , metallurgy , physics , nanotechnology , optics , quantum mechanics
The anisotropy field strength H K is measured in thin nickel and 81/19 nickel‐iron films immediately after deposition and during subsequent systematic annealing in external magnetic fields. These measurements are performed with the films kept in ultra high vacuum using a planar Hall effect method. An analysis of the H K ‐isotherms and of the temperature dependence of H K gives the spectrum of H K ‐contributions of a given film with their relaxation times and activation energies. In non‐magnetostrictive permalloy the main contribution to the anisotropy (of 60 to 85%) is attributed to directional ordering of the iron pairs. In nickel a complicated concurrence of several anisotropy contributions is found. The contribution of the magnetoelastic energy dominates; it can be understood in terms of the constraint model.