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On the Angular Dependence of Sputtering and Kinetic Electron Emission of Single Crystals
Author(s) -
Martynenko Yu. V.
Publication year - 1966
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19660150238
Subject(s) - sputtering , kinetic energy , ion , anisotropy , atomic physics , yield (engineering) , single crystal , maxima , lattice (music) , maxima and minima , angle of incidence (optics) , electron , crystal (programming language) , materials science , molecular physics , chemistry , crystallography , physics , optics , nanotechnology , thin film , art , mathematical analysis , mathematics , programming language , organic chemistry , quantum mechanics , performance art , computer science , acoustics , metallurgy , art history
The dependence of the sputtering yield K on the angle of incidence ϕ is calculated for single crystals by taking into account multiple collisions of the ions with atoms of the crystal. The secondary collisions increase the maxima of the curve K (ϕ) but do not alter the form of the minima. The effect of lattice defects on the function K (ϕ) is also considered. These defects mainly alter the minima in K (ϕ) and on the whole decrease the anisotropy of the sputtering yield. Electron emission from single crystals due to ion bombardment is treated in a similar way assuming a kinetic emission mechanism.