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Stresses in Thin Ni‐Films with Uniaxial Anisotropy
Author(s) -
Gontarz B.,
Ratajczak H.,
Šuda P.
Publication year - 1966
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19660150112
Subject(s) - anisotropy , materials science , perpendicular , incidence (geometry) , angle of incidence (optics) , porosity , condensed matter physics , thin film , plane (geometry) , composite material , optics , geometry , physics , nanotechnology , mathematics
Measurements are made of linear stresses in Ni‐films deposited at angles of incidence of the vapour ranging from 0 to 80°, perpendicular (σ x ) and parallel (σ y ) to the plane of incidence. The stresses are found to increase for small angles and to decrease for angles above 20°. The stresses σ y decrease more rapidly, and become negative above 60°. This dependence of the stresses on the angle of incidence of the vapour can be explained in terms of the anisotropy of the porosity.