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Induced Anisotropy of Monocrystalline and Polycrystalline NiCo Films
Author(s) -
Ruske W.,
Weber P.
Publication year - 1965
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19650120130
Subject(s) - monocrystalline silicon , anisotropy , crystallite , materials science , condensed matter physics , substrate (aquarium) , crystallography , optics , metallurgy , silicon , chemistry , physics , geology , oceanography
The uniaxial anisotropy of electrolytically deposited monocrystalline and polycrystalline NiCo films is measured as a function of film composition in the Ni‐rich region. The experimental data are compared with theoretical values derived from known models proposed to explain the origin of the induced anisotropy. It is shown that the main part of the uniaxial anisotropy of these films can be considered to be a consequence of the magnetoelastic component of the anisotropy energy resulting from the constraint imposed on the film by the substrate.