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The Contribution of Multiple Vacancies to Self‐Diffusion
Author(s) -
Seeger A.,
Schottky G.,
Schumacher D.
Publication year - 1965
Publication title -
physica status solidi (b)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.51
H-Index - 109
eISSN - 1521-3951
pISSN - 0370-1972
DOI - 10.1002/pssb.19650110134
Subject(s) - arrhenius plot , arrhenius equation , curvature , diffusion , self diffusion , plot (graphics) , thermodynamics , activation energy , materials science , chemistry , physics , mathematics , statistics , geometry , self service , marketing , business
The deviations from a straight line of an Arrhenius plot of self‐diffusion coefficients are discussed in terms of the contribution of multiple vacancies to self‐diffusion. It is shown that for nickel the major part of the curvature may be accounted for by di‐ and trivacancy contributions. A small residual curvature of the Arrhenius plot is possibly indicative of a temperature dependence of the activation entropies.