Premium
Development of a Planarization Process for the Fabrication of Nanocrystalline Diamond Based Photonic Structures
Author(s) -
Heupel Julia,
Felgen Nina,
Merz Rolf,
Kopnarski Michael,
Reithmaier Johann Peter,
Popov Cyril
Publication year - 2019
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201970072
Subject(s) - chemical mechanical planarization , materials science , nanopillar , diamond , polishing , fabrication , etching (microfabrication) , nanocrystalline material , nanotechnology , surface roughness , optoelectronics , reactive ion etching , lithography , nanostructure , composite material , layer (electronics) , medicine , alternative medicine , pathology
Smoothened Nanocrystalline Diamond Surface A planarization of nanocrystalline diamond (NCD) films utilizing spin‐on‐glass (SOG) consisting of perhydropolysilazane and subsequent O 2 /SF 6 plasma etching leads to a significant surface roughness reduction. The scattering effects during e‐beam lithography are minimized and the quality of the fabricated nanostructures (nanopillars and photonic crystals) is considerably improved. More details can be found in article number 1900314 by Julia Heupel, Cyril Popov and co‐workers.