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High‐Rate Growth of Single‐Crystalline Diamond (100) Films by Hot‐Filament Chemical Vapor Deposition with Tantalum Filaments at 3000 °C
Author(s) -
Tabakoya Taira,
Kanada Shohei,
Wakui Yusuke,
Takamori Yue,
Yamada Tatsuki,
Nagai Masatsugu,
Kojima Yoshiyasu,
Ariyada Osamu,
Yamasaki Satoshi,
Nebel Christoph E.,
Matsumoto Tsubasa,
Inokuma Takao,
Tokuda Norio
Publication year - 2019
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201970071
Subject(s) - chemical vapor deposition , diamond , tantalum , protein filament , materials science , substrate (aquarium) , deposition (geology) , growth rate , chemical engineering , nanotechnology , analytical chemistry (journal) , composite material , mineralogy , metallurgy , chemistry , geology , geometry , chromatography , paleontology , oceanography , mathematics , sediment , engineering
Single‐Crystalline Diamond In article number 1900244 , Taira Tabakoya, Norio Tokuda, and co‐workers achieve high growth‐rate of single‐crystalline‐diamond with 3000 °C by using tantalum filament in a hot‐filament chemical vapor deposition system. The cover image expresses the process (the machine and inner chamber) and the results (the result of growth‐rate and the grown diamond substrate).