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Introduction of an Al Seed Layer for Facile Adsorption of MoCl 5 during Atomic Layer Deposition of MoS 2
Author(s) -
Ahn Wonsik,
Lee Hyangsook,
Cho Yeonchoo,
Byun Kyung-Eun,
Kim Hoijoon,
Leem Mirine,
Lee Heesoo,
Park Taejin,
Lee Eunha,
Shin Hyeon-Jin,
Kim Hyoungsub
Publication year - 2020
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201901042
Subject(s) - deposition (geology) , layer (electronics) , atomic layer deposition , adsorption , etching (microfabrication) , materials science , bilayer , crystallite , seeding , chemical engineering , growth rate , analytical chemistry (journal) , chemistry , nanotechnology , metallurgy , chromatography , membrane , biochemistry , aerospace engineering , paleontology , sediment , engineering , biology , geometry , mathematics
A low‐temperature one‐step growth method for few‐layer MoS 2 using an atomic layer deposition scheme with MoCl 5 and H 2 S precursors is systematically studied by introducing an ultrathin Al seed layer. First, to optimize the deposition conditions, the effects of the deposition (200–420 °C) and MoCl 5 canister (100–160 °C) temperatures on the MoS 2 growth behavior are investigated. On the SiO 2 surface, increasing the deposition temperature reduces the growth rate while favoring more lateral growth. However, an increase in the MoCl 5 sublimating temperature, which is beneficial to improve the film quality, sharply reduces the growth rate, probably owing to the pronounced self‐etching effect of MoCl 5 . To compensate for the reduced deposition rate while maintaining the MoS 2 quality, an ultrathin Al seed layer (≈5 nm) is introduced, which promotes the surface adsorption of MoCl 5 molecules at an early growth stage according to density functional theory calculations. Thus, a polycrystalline mono‐to‐bilayer MoS 2 film with negligible amounts of residual contaminants (particularly Cl and Al) is successfully synthesized using the proposed Al seeding approach.