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Layered MoS 2 Nanosheets Fabricated by Vacuum Electron Beam Evaporation and Thickness‐Dependent Field Emission Properties
Author(s) -
Guo Mei-Mei,
Wang Xiao-Ping,
Wang Li-Jun,
Yang Xin-Wei,
Yang Ying,
Li Meng-Han,
Deng Man-Jun
Publication year - 2019
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201900180
Subject(s) - materials science , field electron emission , electron beam physical vapor deposition , nanosheet , vacuum deposition , cathode ray , evaporation , ultra high vacuum , vacuum evaporation , deposition (geology) , chemical vapor deposition , electron , ceramic , thin film , beam (structure) , optoelectronics , composite material , nanotechnology , optics , paleontology , physics , quantum mechanics , sediment , biology , thermodynamics
A series of 2D MoS 2 nanosheet films are fabricated on Mo‐coated alumina ceramics using a vacuum electron beam vapor deposition technique. It is found that both the crystallographic orientation and the thickness of the films can be controlled well by changing the processing conditions. It is demonstrated that the thickness of the deposited MoS 2 films has a direct effect on their microtopographies and field emission characteristics. For each MoS 2 film, its field emission performance increases first with an increase in thickness and subsequently decreases in the examined thickness range; the best film thickness is 15 nm. All the experimental results are explained in detail.