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Surface Grating Fabrication by Inductively Coupled Plasma Dry Etching for InP‐Based Photonic Integrated Circuits (Phys. Status Solidi A 18∕2018)
Author(s) -
Zhang Juan,
Sun Changzheng,
Xiong Bing,
Zheng Yanzhen,
Wang Jian,
Hao Zhibiao,
Wang Lai,
Han Yanjun,
Li Hongtao,
Luo Yi,
Xiao Yi,
Yu Chuanqing,
Tanemura Takuo,
Nakano Yoshiaki
Publication year - 2018
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201870042
Subject(s) - fabrication , grating , etching (microfabrication) , inductively coupled plasma , dry etching , optoelectronics , materials science , photonic integrated circuit , plasma , photonics , plasma etching , nanotechnology , physics , layer (electronics) , medicine , alternative medicine , pathology , quantum mechanics
Plasma Dry Etching The fabrication of surface gratings on indium phosphide based materials by inductively coupled plasma (ICP) dry etching is studied to achieve aspect ratio while maintaining excellent surface morphology. By taking advantages of the lag effect, fine structures with non‐uniform height can be completed in a single‐step ICP dry etching, thus greatly simplifying the fabrication by eliminating the demanding overlay process. More details can be found in article number 1800406 by Juan Zhang, Changzheng Sun and co‐workers.