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Characteristics of Ultrathin Ni Films
Author(s) -
Grilli Maria Luisa,
Vernhes Richard,
Hu Guohang,
Di Sarcina Ilaria,
Dikonimos Theodoros,
Sytchkova Anna,
Martinu Ludvik,
He Hongbo,
Piegari Angela
Publication year - 2019
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201800728
Subject(s) - materials science , x ray reflectivity , refractive index , thin film , molar absorptivity , x ray photoelectron spectroscopy , sputtering , ellipsometry , nickel , optics , metal , reflection (computer programming) , oxide , optoelectronics , analytical chemistry (journal) , metallurgy , chemical engineering , nanotechnology , chemistry , physics , engineering , chromatography , computer science , programming language
Conductive and transparent ultra‐thin Nickel films are grown by RF sputtering on fused silica substrates. The characteristics of Ni films (thickness, refractive index, and extinction coefficient) are obtained by fitting multi‐angle spectrophotometric and ellipsometric data. Films thickness inferred by X ray reflection (XRR) measurements is in good accordance with ellipsometric results. XPS analysis reveals that Ni metal phase is present in the film surface together with Ni mixed oxide phases, which explains the high electrical stability of such films.