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Surface Grating Fabrication by Inductively Coupled Plasma Dry Etching for InP‐Based Photonic Integrated Circuits
Author(s) -
Zhang Juan,
Sun Changzheng,
Xiong Bing,
Zheng Yanzhen,
Wang Jian,
Hao Zhibiao,
Wang Lai,
Han Yanjun,
Li Hongtao,
Luo Yi,
Xiao Yi,
Yu Chuanqing,
Tanemura Takuo,
Nakano Yoshiaki
Publication year - 2018
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201800406
Subject(s) - fabrication , materials science , inductively coupled plasma , dry etching , indium phosphide , grating , etching (microfabrication) , photonic integrated circuit , optoelectronics , reactive ion etching , phosphide , optics , photonics , nanotechnology , plasma , gallium arsenide , medicine , physics , alternative medicine , pathology , quantum mechanics , layer (electronics) , nickel , metallurgy
Surface gratings are widely used in photonic integrated circuits (PICs). In this paper, the authors study the fabrication of surface gratings on indium phosphide (InP) based materials by inductively coupled plasma (ICP) dry etching. The etching parameters are optimized to achieve high aspect ratio while maintaining excellent surface morphology. A novel processing technique is presented for surface grating formation on top of a deeply etched ridge waveguide by taking advantages of the lag effect. Fine structures with non‐uniform height can be completed in a single‐step ICP dry etching, thus greatly simplifying the fabrication by eliminating the demanding overlay process. The method is believe to be valuable for the fabrication of a variety of PICs containing hyperfine structures.