Premium
Investigation of SiO 2 /TiO 2 Index Matching Layer Applied to MTO/Ag/MTO Structured Film Deposited on PET Substrate
Author(s) -
Yoon Sangmoo,
Kim Taekeun,
Jang Guneik
Publication year - 2018
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201700974
Subject(s) - materials science , layer (electronics) , substrate (aquarium) , refractive index , optoelectronics , passivation , transmittance , wavelength , ultraviolet , optics , visible spectrum , color difference , nanotechnology , enhanced data rates for gsm evolution , telecommunications , oceanography , physics , computer science , geology
For the commercial application of transparent conductive oxide (TCO) materials in touch screens, the incident light should be reflected at the interfaces between the stacked TCO layers having different refractive indices. To reduce optical loss, the presence of an index‐matching (IM) passivation layer between the conductive layer and substrate is necessary. The objective of the present study is to evaluate and compare the effects of an IM layer (SiO 2 /TiO 2 ) on the optical spectra and color variation in the case of MTO/Ag/MTO films with and without the SiO 2 /TiO 2 layers. The optical properties are systematically investigated using an ultraviolet (UV)‐visible (Vis) spectrophotometer. The optical transmittance of all fabricated films is higher than 85% at the wavelength of 550 nm. The optimal thickness of the SiO 2 /TiO 2 layer is SiO 2 (90, 100 nm)/TiO 2 (10 nm). A low reflectance difference (ΔR 550nm ) of 1.5 and 1.3%, and the color difference representing the blue‐yellow color (Δb*) of 0.6 and 3.1 are achieved with the optimal thickness of SiO 2 (90 and 100 nm)/TiO 2 (10 nm), respectively.