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Highly Resistant Zero‐Order Waveplates Based on All‐Silica Multilayer Coatings
Author(s) -
Grinevičiūtė Lina,
Andrulevičius Mindaugas,
Melninkaitis Andrius,
Buzelis Rytis,
Selskis Algirdas,
Lazauskas Algirdas,
Tolenis Tomas
Publication year - 2017
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201700764
Subject(s) - materials science , birefringence , optics , laser , optoelectronics , waveplate , polarization (electrochemistry) , fluence , nanosecond , deposition (geology) , thin film , nanotechnology , paleontology , chemistry , physics , sediment , biology
Waveplates, used to modify polarization state of light, are integral part of high‐power lasers. Classical approach to waveplate manufacturing is based on combination of birefringent crystalline materials and deposition of nonpolarizing antireflection (AR) coatings. Their limitation to withstand maximal peak power is determined by laser‐induced damage (LID) phenomena, mainly determined by low band‐gap materials used in AR coatings. In this study, a novel multi‐layer approach of high band‐gap birefringent coatings was proposed and investigated to overcome this limitation. Three eligible candidate materials, namely LaF 3 , Al 2 O 3 , and SiO 2 are investigated. Structural and optical analysis reveal superior properties of silica for UV spectral range. Zero‐order thin film retarders based on all‐silica nano‐structures are fabricated by oblique angle deposition process. Low optical losses and high transparency ( T ∼ 99%) are demonstrated while indicating potential to withstand high laser fluence of 40 J cm −2 in nanosecond regime at 355 nm wavelength. Such waveplates can essentially improve maximal tolerated peak power and thus allow production of more compact optical systems, even when high laser power is used.