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All‐Solution‐Processed, Scalable, Self‐Cracking Ag Network Transparent Conductor
Author(s) -
Yang Chaobin,
Merlo Juan M.,
Kong Jiantao,
Xian Zhike,
Han Bing,
Zhou Guofu,
Gao Jinwei,
Burns Michael J.,
Kempa Krzysztof,
Naughton Michael J.
Publication year - 2018
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201700504
Subject(s) - materials science , fabrication , photomask , photoresist , substrate (aquarium) , conductor , electrical conductor , cracking , acrylate , scalability , lithography , nanotechnology , composite material , surface roughness , surface finish , optoelectronics , polymer , resist , computer science , copolymer , medicine , oceanography , alternative medicine , layer (electronics) , pathology , database , geology
A scalable and a fully solution‐based method is developed to produce environmentally stable Ag micro/nanowire networks for transparent conductors. By applying a self‐cracking, water‐soluble acrylate copolymer film as a photoresist mask, the need for formal photomask fabrication and costly vacuum and lithographic facilities is obviated. Also, an increase in adhesion and a decrease in roughness of the metal networks is demonstrated by depositing metal into the regions created by the glass etch step. As a result, the networks can potentially be inexpensively scaled to large areas, as well as be flexible after removal from the substrate. They also exhibit record values of figures of merit that have been employed in the literature, offering a possibly excellent replacement for ITO.