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Physical vapor deposition of methylammonium tin iodide thin films
Author(s) -
Arend Thomas R.,
Tönnies Marc,
Reisbeck Patrick,
Rieckmann Christopher J. P.,
Kersting Roland
Publication year - 2017
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201600796
Subject(s) - thin film , tin , materials science , photoluminescence , halide , iodide , deposition (geology) , chemical vapor deposition , optoelectronics , layer (electronics) , nanotechnology , analytical chemistry (journal) , inorganic chemistry , chemistry , metallurgy , chromatography , paleontology , sediment , biology
Methylammonium tin halides have been identified as a substitute for the lead‐based perovskites in photovoltaic devices. We report the fabrication of CH 3 NH 3 SnI 3 thin films using physical vapor deposition. The periodic deposition of SnI 2 and CH 3 NH 3 I yields thin films that homogeneously cover areas as large as 100 cm 2 . The microscopic homogeneity of the layers causes a metallic reflectivity. Photoluminescence studies indicate that the density of states is inhomogeneously broadened. The films are stable as long as contact with air is avoided. Light‐induced degradation is marginal, even up to illumination levels that approach the dose expected for future photovoltaic devices. Image of a branch with leaves reflected by a 10 cm × 10 cm MASnI 3 layer, which illustrates the achieved surface quality.