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Nanostructured multi‐crystalline silicon solar cell with isotropic etching by HF/KMnO 4
Author(s) -
Jiang Ye,
Shen Honglie,
Zheng Chaofan,
Pu Tian,
Wu Jing,
Rui Chunbao,
Yang Wangyang,
Li Yufang
Publication year - 2017
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201600703
Subject(s) - materials science , oxidizing agent , solar cell , isotropic etching , etching (microfabrication) , energy conversion efficiency , black silicon , silicon , reactive ion etching , optoelectronics , crystalline silicon , nanotechnology , nanostructure , chemical engineering , chemistry , organic chemistry , layer (electronics) , engineering
Metal‐assisted chemical etching (MACE) method is an efficient way to improve the power conversion efficiency of solar cell by developing nanostructures. Normally, hydrogen peroxide is widely used as an oxidizing agent, through which anisotropic etching of nanostructures could be achieved. Here, nanoscale textured multi‐crystalline silicon (mc‐Si) solar cell with an efficiency of 18.13% was fabricated by MACE method with potassium permanganate (KMnO 4 ) as an oxidizing agent. The isotropic etching by KMnO 4 showed the great uniformity of surface reflectance, corresponding to the isotropic oval pits. The solar cell presented an increase of 0.72mA · cm −2 in the short‐circuit current density comparing with the mc‐Si solar cell fabricated by the traditional process. Though the efficiency still needed optimizing, isotropic etching for mc‐Si would lead a new tendency for MACE technique.