z-logo
Premium
Structural, electrical, and optical properties of polycrystalline NbO 2 thin films grown on glass substrates by solid phase crystallization
Author(s) -
Nakao Shoichiro,
Kamisaka Hideyuki,
Hirose Yasushi,
Hasegawa Tetsuya
Publication year - 2017
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201600604
Subject(s) - materials science , crystallinity , natural bond orbital , crystallite , crystallization , thin film , amorphous solid , electrical resistivity and conductivity , band gap , analytical chemistry (journal) , annealing (glass) , chemical engineering , mineralogy , crystallography , nanotechnology , chemistry , composite material , optoelectronics , metallurgy , density functional theory , organic chemistry , electrical engineering , engineering , computational chemistry
We investigated the structural, electrical, and optical properties of polycrystalline NbO 2 thin films on glass substrates. The NbO 2 films were crystallized from amorphous precursor films grown by pulsed laser deposition at various oxygen partial pressures ( P O2 ). The electrical and optical properties of the precursor films systematically changed with P O2 , demonstrating that the oxygen content of the precursor films can be finely controlled with P O2 . The precursors were crystallized into polycrystalline NbO 2 films by annealing under vacuum at 600 °C. The NbO 2 films possessed extremely flat surfaces with branching patterns. Even optimized films showed a low resistivity ( ρ ) of 2 × 10 2  Ω cm, which is much lower than the bulk value of 1 × 10 4  Ω cm, probably because of the inferior crystallinity of the films compared with that of a bulk NbO 2 crystal. Both oxygen‐rich and ‐poor NbO 2 films showed lower ρ than that of the stoichiometric film. The NbO 2 film with the highest ρ showed an indirect bandgap of 0.7 eV.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom