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High temperature annealing and CVD growth of few‐layer graphene on bulk AlN and AlN templates
Author(s) -
Dagher R.,
Matta S.,
Parret R.,
Paillet M.,
Jouault B.,
Nguyen L.,
Portail M.,
Zielinski M.,
Chassagne T.,
Tanaka S.,
Brault J.,
Cordier Y.,
Michon A.
Publication year - 2017
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201600436
Subject(s) - graphene , materials science , raman spectroscopy , chemical vapor deposition , annealing (glass) , template , atomic force microscopy , nanotechnology , atomic layer deposition , chemical engineering , layer (electronics) , optoelectronics , composite material , optics , physics , engineering
Graphene and AlN are promising materials, interesting to combine together. In this study, we will present first results for direct growth of graphene on bulk AlN and on AlN templates using chemical vapor deposition, including the annealing of these substrates at high temperatures. Atomic force microscopy (AFM) enabled us to study the evolution of the AlN surface morphology after annealing and growth. Few‐layer graphene deposition is demonstrated on the basis of X‐ray photoemission and Raman spectroscopy. AFM view of graphene wrinkles on the N‐face of bulk AlN.