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Effect of n‐ and p‐type doping concentrations and compensation on the electrical properties of semiconducting diamond
Author(s) -
Traoré Aboulaye,
Koizumi Satoshi,
Pernot Julien
Publication year - 2016
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201600407
Subject(s) - diamond , doping , acceptor , compensation (psychology) , electrical resistivity and conductivity , impurity , materials science , boron , electron mobility , condensed matter physics , phosphorus , optoelectronics , analytical chemistry (journal) , engineering physics , chemistry , physics , metallurgy , organic chemistry , chromatography , psychology , quantum mechanics , psychoanalysis
Abstract We report an exhaustive description of electrical properties of mono‐crystalline diamond epilayers doped with boron and phosphorus impurities. Carrier density, carrier mobility, and resistivity have been calculated for boron and phosphorus doped diamond as a function doping level and a compensation for values ranging between 1014 and 1020cm − 3at two different temperatures of 300 and 500 K. The calculated values are graphically compared with experimental data from the literature and discussed in terms of device performances. Finally, an example of use of the graphics is given by comparing the IV characteristics of the first pn diamond junction with our calculations. Theoretical hole mobility as function of acceptor concentration and compensation at 300 and 500 K. The symbols are experimental data from references given in the text.