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Enhanced interference using microcavity structure for accurate thin film thickness measurement (Phys. Status Solidi A 12∕2015)
Author(s) -
Feng Yuanxiang,
Chen Shuming
Publication year - 2015
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201570479
Subject(s) - interference (communication) , thin film , materials science , reflectivity , cover (algebra) , optics , optoelectronics , spectral line , physics , nanotechnology , computer science , telecommunications , engineering , channel (broadcasting) , mechanical engineering , astronomy
A new method based on a microcavity structure is developed for accurately measuring the thickness of organic thin films (see the article by Yuanxiang Feng and Shuming Chen on pp. 2718–2721 ). By sandwiching the thin films between a bottom reflective mirror and a top semi‐reflective mirror, which is shown in the upper‐left device in the cover image, the interference effect is greatly enhanced. As a result, the reflectance spectra exhibit a distinctive, strong and sharp interference peak which is shown in the figure in the bottom‐right of the cover image. The interference pattern is very sensitive to the thickness of the thin films. By fitting the interference pattern with the calculated reflectance spectra, the thickness of the thin films can be accurately determined.