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Evolution of the microstructure in titanium dioxide films during chemical vapor deposition
Author(s) -
Baryshnikova Marina,
Filatov Leonid,
Mishin Maxim,
Uvarov Andrey,
Kondrateva Anastasia,
Alexandrov Sergey
Publication year - 2015
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201532300
Subject(s) - crystallinity , materials science , microstructure , chemical vapor deposition , titanium dioxide , anatase , amorphous solid , crystallite , chemical engineering , rutile , substrate (aquarium) , texture (cosmology) , deposition (geology) , titanium , combustion chemical vapor deposition , thin film , mineralogy , metallurgy , nanotechnology , photocatalysis , composite material , carbon film , crystallography , chemistry , geology , catalysis , organic chemistry , engineering , paleontology , sediment , artificial intelligence , image (mathematics) , oceanography , computer science
Chemical vapor deposition (CVD) provides fabrication of high purity conformal layers of titanium dioxide with different structure for various applications. In this work CVD of titania layers from titanium tetraisopropoxide (TTIP) and oxygen at 1 kPa and in the substrate temperature range T s = 300–500 °C was studied. It was found that growth of TiO 2 is a non‐stationary process. Two periods of time characterized by different deposition rates were observed. Formation of amorphous TiO 2 occurs at the initial period of the deposition process whereas polycrystalline titania with anatase crystal structure is deposited at the second period. Substrate temperature determines degree of crystallinity, texture, and microstructure of the deposited titania layers.