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Durable high‐performance anti‐reflection coatings via atmospheric pressure processing
Author(s) -
Yates Heather M.,
Hodgkinson John L.,
Tandy Richard W.
Publication year - 2015
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201532286
Subject(s) - materials science , durability , high refractive index polymer , refractive index , coating , reflection (computer programming) , glazing , layer (electronics) , porosity , anti reflective coating , thin film , composite material , optoelectronics , optical coating , optics , nanotechnology , computer science , physics , programming language
Anti‐reflection layers are critical to the performance of many optical systems, including large area, cost sensitive products such as displays, architectural glazing, photovoltaics, and solar thermal collectors. The action of such layers is a product of a low‐refractive index, which can be achieved by multi‐layer interference stacks or (as in this work) via porous structures whereby air filled voids provide a net reduction in index, minimizing the reflection at each interface. In this work, we use flame assisted CVD (FACVD) generated anti‐reflection layers which produce controllably porous silica film. Such films can also be grown with a graded refractive index, resulting in a highly effective anti‐reflection coating. A further critical property is the durability of the films and their optical properties as performance can be lost due to environmental contamination and moisture ingress. We report on use of additional thin organic films, which could significantly enhance such durability.