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Co 3 O 4 /TiO 2 heterostructures obtained by hybrid method
Author(s) -
El Habra N.,
Visentin F.,
Gerbasi R.,
Favaro M.,
Natile M. M.,
Colazzo L.,
Sambi M.
Publication year - 2015
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201532260
Subject(s) - heterojunction , materials science , anatase , nanostructure , polystyrene , atomic layer deposition , chemical engineering , nanotechnology , photocatalysis , substrate (aquarium) , surface area to volume ratio , layer (electronics) , optoelectronics , polymer , composite material , catalysis , chemistry , organic chemistry , oceanography , geology , engineering
High surface‐to‐volume ratio Co 3 O 4 /TiO 2 heterojunctions were fabricated by combining different methods. Atomic layer deposition (ALD) and a photochemical method were used to coat polystyrene (PS) 3D‐Direct Opal (3D‐DO) structures on conductive ITO substrates. Firstly, 3D‐DO of PS were crystallized on ITO substrates to form the high surface‐to‐volume ratio template via a self‐assembly method. A low‐temperature ALD TiO 2 film was infiltrated onto the PS opal structure. Then, the PS template was removed by a thermal treatment in air at 450 °C for 5 h. Hollow anatase phase nanospheres were obtained, crystallized in a face centered cubic (FCC) lattice with the (111) plane oriented parallel to the substrate surface. Finally, the hollow TiO 2 nanospheres were coated with Co 3 O 4 via a photochemical method. This ordered 3D nanostructure with designed morphology may find applications as surface‐enhanced materials for photovoltaic devices. TiO 2 hollow nanospheres obtained via low‐pressure ALD (a) and Co 3 O 4 /TiO 2 heterostructure (scanned region: 1.5 μm) (b).