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Effect of deposition temperature on transparent conductive properties of γ‐CuI film prepared by vacuum thermal evaporation
Author(s) -
Zi Min,
Li Juan,
Zhang Zichao,
Wang Xuesong,
Han Jun,
Yang Xiaopeng,
Qiu Zhiwen,
Gong Haibo,
Ji Ziwu,
Cao Bingqiang
Publication year - 2015
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201532015
Subject(s) - materials science , crystallite , electrical resistivity and conductivity , vacuum evaporation , substrate (aquarium) , vacuum deposition , deposition (geology) , evaporation , transmittance , analytical chemistry (journal) , hall effect , atmospheric temperature range , diffraction , electrical conductor , photoluminescence , thin film , composite material , optics , optoelectronics , nanotechnology , chemistry , metallurgy , oceanography , engineering , biology , paleontology , chromatography , thermodynamics , physics , sediment , meteorology , electrical engineering , geology
Copper (I) iodide (CuI) films are grown on glass substrates with a direct vacuum thermal evaporation method, and the effect of substrate temperature on their photoluminescence and transparent conductive properties is discussed. The X‐ray diffraction (XRD) measurement identifies the polycrystalline CuI film has γ‐phase with (111) preferential growth direction. When the substrate temperature is optimised at 120 °C, the average transmittance is about 90% in the wavelength range of 410–1500 nm. The electrical properties measured by Hall effect show the lowest resistivity of 1.0 × 10 −2 Ωcm with hole concentration of 3.0 × 10 19 cm −3 and mobility of 25 cm 2 V −1 s −1 . These results indicate that direct thermal deposition is a simple method to grow high quality p‐type CuI films.