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Growth of Ru–SiO 2 underlayer for Co 72 Pt 28 –SiO 2 nanocomposite films
Author(s) -
Tang Rujun,
Ho Pin
Publication year - 2014
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201330298
Subject(s) - coercivity , materials science , remanence , grain size , texture (cosmology) , layer (electronics) , microstructure , deposition (geology) , analytical chemistry (journal) , composite material , magnetization , chemistry , geology , condensed matter physics , paleontology , physics , image (mathematics) , chromatography , quantum mechanics , artificial intelligence , sediment , magnetic field , computer science
The effects of sputter growth conditions of Ru–SiO 2 under‐layer (hereafter referred as Ru t layer) on the microstructure of this layer were studied. The effects of growth conditions of the Ru t layer on the microstructure and magnetic properties of the Co 72 Pt 28 –SiO 2 top layer were further investigated. Results show that increasing SiO 2 content in the Ru t layer deteriorates slightly the texture of Ru grains in this layer generally. The high‐pressure (1.3 Pa) deposition can better protect the texture of Ru than low‐pressure (0.4 Pa) deposition with SiO 2 addition. Furthermore, high‐pressure deposition of Ru t layer with low SiO 2 content produces better texture of Co 72 Pt 28 than low pressure. The sizes of Ru grains and Co 72 Pt 28 grains decrease with increasing SiO 2 content. A high‐pressure deposition of Ru t layer further reduces the grain size of Co 72 Pt 28 . Both the coercivity and the remanence ratio of Co 72 Pt 28 layer decrease when SiO 2 content in the Ru t layer exceeds 10 vol.%. High‐pressure deposition of Ru t layer results in a higher coercivity and remanence ratio of Co 72 Pt 28 layer than those with low‐pressure depositions. The above results show that the grain size of Co 72 Pt 28 can be reduced without sacrificing its magnetic properties at small SiO 2 content.