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Evaluation of optimal chlorine doping concentration in zinc oxide on glass for application as new transparent conductive oxide
Author(s) -
Lee Jaechul,
Subramaniam Nagarajan Ganapathi,
Lee Juwon,
Lee Jaechoon,
Kang Taewon
Publication year - 2013
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201330042
Subject(s) - wurtzite crystal structure , x ray photoelectron spectroscopy , materials science , zinc , thin film , doping , chlorine , transparent conducting film , pulsed laser deposition , transmittance , oxide , analytical chemistry (journal) , absorption spectroscopy , electrical resistivity and conductivity , absorption (acoustics) , optoelectronics , chemical engineering , nanotechnology , optics , chemistry , metallurgy , composite material , physics , electrical engineering , chromatography , engineering
ZnO:Cl thin films grown on glass substrates at 200 °C by the pulsed laser deposition (PLD) technique using ZnO:Cl targets show preferential c ‐axis (0002) orientation having hexagonal wurtzite structure without secondary phases. The chlorine concentration in the ZnO:Cl thin films is varied from 1.04 to 7.28 at%. X‐ray photoelectron spectroscopy (XPS) studies indicate existence of ZnO and ZnCl bonding. Hall effect measurements and UV–Visible absorption spectra show lowest resistivity of 6.12 × 10 −4 Ω cm and average transmittance of 92% in the visible range for the 4.16 at% chlorine‐doped ZnO thin film. Possible application of the material as a new transparent conductive zinc oxide is very much imminent in optoelectronic devices.