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Fabrication of silicon nanostructures using metal‐assisted etching in NaBF 4
Author(s) -
Nguyen Nhung T. P.,
Coffinier Yannick,
Thomy Vincent,
Boukherroub Rabah
Publication year - 2013
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201330035
Subject(s) - materials science , etching (microfabrication) , silicon , nanostructure , substrate (aquarium) , scanning electron microscope , silver nitrate , nanotechnology , aqueous solution , doping , fabrication , chemical engineering , isotropic etching , optoelectronics , chemistry , layer (electronics) , composite material , medicine , oceanography , alternative medicine , pathology , geology , engineering
In this report, we demonstrate that sodium tetrafluoroborate (NaBF 4 ) and silver nitrate (AgNO 3 ) aqueous solution can be successfully used as wet etchant to produce silicon nanostructured layers with anti‐reflective properties. The morphology of the resulting nanostructures was studied as a function of various etching parameters, including reactant concentrations, temperature, time, substrate orientation, and doping level. The resulting nanostructures have been characterized using scanning electron microscopy (SEM) and reflectivity measurements.