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The impact of growth parameters on trench defects in InGaN/GaN quantum wells
Author(s) -
Massabuau F. C.P.,
Le Fol A.,
Pamenter S. K.,
Oehler F.,
Kappers M. J.,
Humphreys C. J.,
Oliver R. A.
Publication year - 2014
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201300485
Subject(s) - trimethylindium , materials science , quantum well , trench , optoelectronics , wavelength , diode , light emitting diode , gallium nitride , metalorganic vapour phase epitaxy , optics , nanotechnology , epitaxy , laser , physics , layer (electronics)
The impact of the InGaN growth temperature and of the trimethylindium flux on trench defects has been investigated. We show that the density of defects is affected by both conditions but also their morphology and their emission properties. Therefore, the impact of such defect on the performance of quantum well structures can be controlled by adjusting these two growth conditions. Under usual conditions for making blue light emitting diodes, we observe that the enclosed region of the defect emits light at a longer wavelength. Nevertheless, our data also demonstrate that emission at a shorter wavelength is possible under certain growth conditions.